European Nanolithography Symposium

18. Februar 2020

European Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Zeit: 18. Februar 2020
Veranstaltungsort: 4. Physikalisches Institut
V57.02
Pfaffenwaldring 57
70569  Stuttgart
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Don’t miss your chance to discuss the latest developments in nanolithography and listen to talks covering many different facets of the subject. Customers will speak about their work in lithography, highlighting various aspects of the field. Further talks will be given by the participating companies microresist, nanoscribe, Heidelberg Instruments, Genysis, and Raith, presenting the spectrum of latest state-of-the-art direct write capabilities.

Link  Agenda 

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